Authors
Elzbieta Sikora, Janusz Sikora, Digby D Macdonald
Publication date
1996/4/1
Journal
Electrochimica Acta
Volume
41
Issue
6
Pages
783-789
Publisher
Pergamon
Description
Using Mott-Schottky (M-S) analysis in conjunction with the Point Defect Model (PDM) for passive films, we have determined the oxygen vacancy diffusion coefficient in the WO3−x passive film formed on tungsten in phosphoric acid (pH = 0.96) solution at ambient temperature. The value obtained for Do is in the range (3.7–5.3)× 10−15cm2s.This value was extracted from the exponential relationship between the donor density and the film formation voltage assuming that the depletion region in the film close to the metal/film interface dominates the semiconductor properties.
Total citations
Scholar articles
E Sikora, J Sikora, DD Macdonald - Electrochimica Acta, 1996