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Flexible and stretchable electronic (FSE) transistors create various novel applications. Carbon nanotubes possess high intrinsic mobility and exceptional mechanical and optical characteristics, which lead to a great potential as channel and electrodes in FSE transistors. At the same time, gate dielectric is also required to be intrinsically flexible/stretchable and integratable. However, few high‐performance solutions have been reported. By adopting polyvinyl alcohol (PVA)/SiO₂ hybrid layer as dielectric, the integration of high‐performance intrinsically flexible/stretchable carbon‐nanotube‐based thin film transistors is proposed and realized simply by traditional photolithography‐etching and low‐temperature solution processes. The PVA/SiO₂ dielectric simultaneously provides a relatively high‐k value, improves the carrier conduction interface, increases the carbon nanotube (CNT) density, and protects the PVA from …