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Understanding of light-matter interaction in such nanoscale-patterned structures can reveal novel phenomena in modern physics and find new applications in metamaterials, nanophotonic and nano-optoelectric components, devices and systems as well. As the optical and photonic properties of optical nanostructures strongly depend on the morphology [1], size [2], geometry [3–5] and periodicity [6] of their elements advanced nanolithography has been the key enabler for the rapid development of nanophotonics, plasmonics and metamaterials Photonic structures and metamaterials operating in microwave frequencies can be formed by assembly of metallic wires and rings [7] and layered planar arrays [8], and conventional printed circuit board technique [9]. In the optical region, typical structural size (the pitch of the periodical element) varies from micrometers for infrared to as small as 200 nm for UV and, besides the conventional optical lithography [10, 11] electron beam lithography (EBL)[12, 13], laser interference and holographic lithography [14, 15], and recently nanoimprint lithography (NIL)[16–18] are applied. For light wavelength from visible to UV, the structural size can be as small as 200 nm or even below, as the minimum feature size below 50 nm is frequently demanded. A high resolution and large area patterning technique with promising