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Nanoimprint lithography (NIL) technology has aroused great interests in both academia and industry due to its high resolution, low-cost, and high-volume nanopatterning capability. And as an expoxy resin-based negative amplified photoresist, SU-8 is an ideal candidate for NIL because of its low-glass-transition temperature, low-volume shrinkage coefficient, and good optical properties. In this reviewing paper, we highlight the major technical achievements in NIL on epoxy resin and its applications for bio- and nanophotonic structures. NIL was also applied for the duplication of imprint templates, originally fabricated by e-beam lithography (EBL) followed by reactive ion etch (RIE), using a SU-8/SiO2/PMMA tri-layer technique. And nanoimprint properties were systematically investigated for optimization. The developed nanoimprint process for different applications indicates promising industrial potentials in the next …