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Diamond-like carbon (DLC) films 4–400 nm thick were deposited on conductive n-Si and metal substrates using direct ion beam deposition from an RF inductively coupled CH₄-plasma (ICP) source. The field electron emission of the films was examined as a function of deposition conditions and post-deposition surface modification by Ni ultrathin coatings. Electrical properties of the films were studied as well. A specially designed high vacuum scanning tunnelling-field emission microscope was employed for simultaneous mapping of the topography, work function and local field electron emission intensity. Stable, low voltage emission was observed after the emission electric field/current activation process. The activation mechanism was probably the formation of conductive channels in the films to supply electrons for emission from low work function surface areas. Deposition of ultrathin metal coatings on the DLC …