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High-entropy alloy and nitride films of (AlCrSiTiZr)_100−xN_x containing large Zr atoms and small Si atoms were deposited on 6061 aluminum alloy and mild steel substrates by DC reactive magnetron sputtering at various nitrogen flow ratio (R_N). The composition, crystalline structure, and film morphology were analyzed by electron probe X-ray microanalyzer (EPMA), X-ray diffractometer (XRD), transmission electron microscope (TEM), and scanning electron microscope (SEM), respectively. Also, their hardness and elastic modulus were studied by nanoindentation. The corrosion behavior was studied by anodic polarization analysis in 0.1M H₂SO₄ aqueous solution at room temperature. The properties of films deposited under substrate bias application were also studied. The tendency of the present composition to form amorphous or low-crystallinity structure is high because of its large difference in atomic size. Films …