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(AlCrTaTiZr)O_x films were deposited at 350°C by DC magnetron sputtering from high-entropy alloy target. Oxygen concentration increases with oxygen flow ratio, and saturates near 67at.%. As-deposited films have an amorphous structure. Their hardness fall in the range of 8–13GPa. All amorphous oxide films maintain their amorphous structure up to 800°C for at least 1h. After 900°C 5h annealing, crystalline phases with the structures of ZrO₂, TiO₂, or Ti₂ZrO₆ form. Annealing enhances mechanical properties of the films. Their hardness and modulus attain to the values about 20 and 260GPa, respectively. The resistivity of the metallic films is around 10²μΩcm but drastically rises to 10¹²μΩcm when oxygen concentration increases.