Authors
Hongliang Sun, Kaikai Xu, Jianming Zhao, Jing Zhang, Yong Zhou, Lu Liu, Jun Yuan, Lei Huang, Kunfeng Zhu, Lukas W Snyman, Kingsley A Ogudo
Publication date
2019/2/1
Journal
Optical Materials
Volume
88
Pages
711-717
Publisher
North-Holland
Description
A novel polysilicon light emitting device (LED) was realized in a standard complementary metal oxide semiconductor (CMOS) process that is based on a p-n junction reverse bias configuration. This LED can emit visible light based on the reverse bias p-n junctions in the dark. The central emitting doped structure element of this LED is n+-p-n+-p-n+ stacked layout, which is similar to two reverse bias p-n junctions and two forward bias p-n junctions connected in series. The device mechanism for the visible light emitting process is defined by means of an avalanche breakdown process that occurs between the highly doped n+ region and the lightly doped p region in the reverse bias p-n junctions. By using hot carriers generated in avalanche process, the emission spectrum from the device exhibits a wide spectrum whose wavelength range is from 400 nm to 900 nm at an operating voltage of 16 V. We compare the …
Total citations
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