Authors
XB Niu, Y-J Lee, RE Caflisch, C Ratsch
Publication date
2008/8/22
Journal
Physical review letters
Volume
101
Issue
8
Pages
086103
Publisher
American Physical Society
Description
We study the effect of strain on the vertical and lateral self-organization of nanoscale patterns and stacked quantum dots during epitaxial growth. The computational approach is based on the level set method in combination with an atomistic strain code. Strain changes the energetics of microscopic parameters during growth, and thus determines the nucleation sites and the growth of islands and dots. Our results show that strain can lead to vertical alignment as well as lateral organization. Moreover, our simulations suggest that there is an optimal thickness of the capping layer to get the best alignment and most uniform size distribution of stacked quantum dots, and that its variation can be used to control the formation of interesting structures.
Total citations
20082009201020112012201320142015201620171613111111
Scholar articles
XB Niu, YJ Lee, RE Caflisch, C Ratsch - Physical review letters, 2008