Authors
Rahul R Nair, Wencai Ren, Rashid Jalil, Ibtsam Riaz, Vasyl G Kravets, Liam Britnell, Peter Blake, Fredrik Schedin, Alexander S Mayorov, Shengjun Yuan, Mikhail I Katsnelson, Hui‐Ming Cheng, Wlodek Strupinski, Lyubov G Bulusheva, Alexander V Okotrub, Irina V Grigorieva, Alexander N Grigorenko, Kostya S Novoselov, Andre K Geim
Publication date
2010/12/20
Journal
small
Volume
6
Issue
24
Pages
2877-2884
Publisher
WILEY‐VCH Verlag
Description
A stoichiometric derivative of graphene with a fluorine atom attached to each carbon is reported. Raman, optical, structural, micromechanical, and transport studies show that the material is qualitatively different from the known graphene‐based nonstoichiometric derivatives. Fluorographene is a high‐quality insulator (resistivity >1012 Ω) with an optical gap of 3 eV. It inherits the mechanical strength of graphene, exhibiting a Young’s modulus of 100 N m−1 and sustaining strains of 15%. Fluorographene is inert and stable up to 400 °C even in air, similar to Teflon.
Total citations
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