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We demonstrate a novel fabrication approach for high-throughput fabrication of engineered plasmonic antenna arrays and metamaterials with Nanostencil Lithography (NSL). NSL technique, relying on deposition of materials through a shadow mask, offers the flexibility and the resolution to fabricate radiatively engineer nanoantenna arrays for excitation of collective plasmonic resonances. We confirmed that the antenna arrays fabricated by NSL shows high optical quality similar to EBL fabricated ones. Furthermore, we show nanostencils can be reused multiple times to fabricate selfsame structures with identical optical responses repeatedly and reliably. This capability is particularly useful when highthroughput replication of the optimized nanoparticle arrays is desired. In addition to its high-throughput capability, NSL permits single step nanofabrication of plasmonic devices on surfaces that are difficult to work with …