Authors
Zhaojun Lin, Wu Lu, Jaesun Lee, Dongmin Liu, Jeffrey S Flynn, George R Brandes
Publication date
2003/6/16
Journal
Applied Physics Letters
Volume
82
Issue
24
Pages
4364-4366
Publisher
American Institute of Physics
Description
Ir, Ni, and Re Schottky contacts on strained heterostructures are characterized using capacitance–voltage and techniques. Based on the measured characteristics, two dimensional electron gas sheet carrier concentrations at the AlGaN/GaN interface and barrier heights of Ir, Ni, and Re Schottky contacts are calculated. The barrier heights of 1.12, 1.27, and 1.68 eV are obtained for Ir, Ni, and Re Schottky contacts, respectively. The results show that the barrier heights of Schottky contacts on strained AlGaN/GaN heterostructures are strongly dependent on the metal work functions. However, contrary to Schottky contacts on bulk AlGaN or GaN, the barrier height on strained AlGaN/GaN heterostructures is lower for a Schottky contact with a higher metal work function. This is attributed to the stronger wave function coupling between electrons in the Schottky metal and surface donor electrons. The …
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