Profiles

Michael Nolan

Tyndall National Institute, University College Cork, Ireland

Verified email at tyndall.ie

Cited by 9963

atomic layer deposition atomic layer etching photocatalysis computational chemistry metal oxides

Sumit Agarwal

Colorado School of Mines

Verified email at mines.edu

Cited by 3449

Plasma processing photovoltaics atomic layer deposition atomic layer etching nanomaterials

Haozhe Wang

Assistant Professor, Duke University

Verified email at duke.edu

Cited by 2501

2D Materials Atomic Layer Etching 3D Packaging

Andreas Fischer

Technologist, Semiconductor Industry

Verified email at claryconresearch.com

Cited by 2426

Atomic Layer Etching Selective Etch Semiconductor processes Plasma Physics Plasma Confinement

Taewook Nam

Assistant professor at Semiconductor Systems Engineering, Sejong University

Verified email at sejong.ac.kr

Cited by 2378

atomic layer etching atomic layer deposition thin film deposition surface functionalization

Ki Seok Kim

Massachusetts Institute of Technology

Verified email at mit.edu

Cited by 2155

Atomic Layer Etching Plasma CVD Single-Crystal 2D Growth Nano-materials

Bonggeun Shong

Hongik University

Verified email at hongik.ac.kr

Cited by 1954

surface chemistry atomic layer deposition atomic layer etching

Younghee Lee

Lam Research

Verified email at colorado.edu

Cited by 1856

Atomic Layer Etching Atomic Layer Deposition Selective Etch Selective Deposition EUV resist

John Hennessy

Jet Propulsion Laboratory, California Institute of Technology

Verified email at jpl.nasa.gov

Cited by 1762

atomic layer deposition atomic layer etching ultraviolet sensors and systems semiconductor surface passivation

Pankaj Ramnani

University of California, Riverside, Lam Research

Verified email at ucr.edu

Cited by 1094

Atomic Layer Etching Selective Deposition PECVD Carbon-based nanomaterials

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