| 157 nm resist materials: Progress report C Brodsky, J Byers, W Conley, R Hung, S Yamada, K Patterson, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000 | 53 | 2000 |
| 157nm resist materials: a progress report T Chiba, RJ Hung, S Yamada, B Trinque, M Yamachika, C Brodsky, ... Journal of Photopolymer Science and Technology 13 (4), 657-664, 2000 | 86 | 2000 |
| 1X Deep UV Lithography With Chemical Amplification for 1-Micron DRAM Production John G. Maltabcs, Steven J. Holmes, James R. Morrow Roger L. Barr, Mark Hakey, Gregg Reynolds … WR Brunsvold, CG Willson, N Clecak, S MacDonald, H Ito Advances in Resist Technology and Processing 7, 2, 1990 | | 1990 |
| 1X deep-UV lithography with chemical amplification for 1-micron DRAM production JG Maltabes, SJ Holmes, JR Morrow, RL Barr, MC Hakey, G Reynolds, ... Advances in Resist Technology and Processing VII 1262, 2-7, 1990 | 87 | 1990 |
| 2ND-ORDER NLO AND RELAXATION PROPERTIES OF POLED POLYMERS DY YOON, D JUNGBAUER, I TERAOKA, B RECK, R ZENTEL, R TWIEG, ... ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY 202, 153-POLY, 1991 | | 1991 |
| A 2-layer resist system derived from trimethylsilylstyrene SA MacDonald, RD Allen, NJ Clecak, CG Willson, JMJ Frechet Advances in Resist Technology and Processing III 631, 28-33, 1986 | 1 | 1986 |
| A Big Year Ahead for Nano in 2018 WWC Chan, M Chhowalla, O Farokhzad, S Glotzer, Y Gogotsi, JH Hafner, ... ACS nano 11 (12), 11755-11757, 2017 | | 2017 |
| A decade of step and flash imprint lithography CG Wilson Journal of photopolymer science and technology 22 (2), 147-153, 2009 | 55 | 2009 |
| A general approach to retro-isomeric linear peptide synthesis M Chorev, CG Willson, M Goodman Journal of the American Chemical Society 99 (24), 8075-8076, 1977 | 58 | 1977 |
| A hybrid chemo-/grapho-epitaxial alignment strategy for defect reduction in sub-10 nm directed self-assembly of silicon-containing block copolymers G Blachut, SM Sirard, MJ Maher, Y Asano, Y Someya, AP Lane, ... Chemistry of Materials 28 (24), 8951-8961, 2016 | 37 | 2016 |
| A lithographic analog of color photography: self-aligning photolithography using a resist with wavelength-dependent tone WD Hinsberg, SA MacDonald, LA Pederson, CG Willson Journal of imaging science 33 (4), 129-135, 1989 | 10 | 1989 |
| A method to accelerate creation of plasma etch recipes using physics and Bayesian statistics MJ Chopra, R Verma, A Lane, CG Willson, RT Bonnecaze Advanced Etch Technology for Nanopatterning VI 10149, 110-117, 2017 | 8 | 2017 |
| A new approach to 193 NM photoresists: Functionalized and self-plasticized nortricyclene polymers and copolymers. JMJ Fréchet, RP Meagley, QJ Niu, CG Willson, JD Byers ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY 214, 274-PMSE, 1997 | 1 | 1997 |
| A New Materials-based Pitch Division Technique X Gu, C Bates, Y Cho, E Costner, F Marzuka, T Nagai, T Ogata, C Shi, ... Journal of Photopolymer Science and Technology 22 (6), 773-781, 2009 | 16 | 2009 |
| A New Method for Covalently Bonding Functionality to ITO Films TW Holcombe III, M Dickey, CG Willson Abstracts, 57th Southeast/61st Southwest Joint Regional Meeting of the …, 2005 | 2 | 2005 |
| A new oxygen plasma-developable UV-sensitive resist SA MacDonald, H Ito, H Hiraoka, CG Willson SPIE Proc. Tech. Conf. Photopolymers—Principles, Processes and Materials, 177ff, 1985 | 6 | 1985 |
| A new photoresist based on an" unzipping" polyester C Willson, A Lane, W Joo, D Liu, K Matsuzawa, W Wang, B Cassidy, ... ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY 254, 2017 | | 2017 |
| A New Synthetic Route to Authentic N-Substituted Aminomaleimides NR Conley, RJ Hung, CG Willson The Journal of Organic Chemistry 70 (11), 4553-4555, 2005 | 46 | 2005 |
| A positive tone plasma-developable resist obtained by gas-phase image reversal SA MacDonald, H Schlosser, NJ Clecak, CG Willson, JMJ Frechet Chemistry of materials 4 (6), 1364-1368, 1992 | 18 | 1992 |
| A progress report on DSA of high-chi silicon containing block co-polymers CG Willson, D Janes, N Ito, G Blachut, S Sirard, Y Someya, J Doise, ... | | 2018 |
