High power pulsed magnetron sputtering: A review on scientific and engineering state of the art K Sarakinos, J Alami, S Konstantinidis Surface and coatings technology 204 (11), 1661-1684, 2010 | 1234 | 2010 |
Influence of pulse duration on the plasma characteristics in high-power pulsed magnetron discharges S Konstantinidis, JP Dauchot, M Ganciu, A Ricard, M Hecq Journal of applied physics 99 (1), 2006 | 211 | 2006 |
Titanium oxide thin films deposited by high-power impulse magnetron sputtering S Konstantinidis, JP Dauchot, M Hecq Thin Solid Films 515 (3), 1182-1186, 2006 | 204 | 2006 |
Plasma diagnostics for understanding the plasma–surface interaction in HiPIMS discharges: a review N Britun, T Minea, S Konstantinidis, R Snyders Journal of Physics D: Applied Physics 47 (22), 224001, 2014 | 146 | 2014 |
Plasma diagnostics for the low-pressure plasma polymerization process: A critical review D Thiry, S Konstantinidis, J Cornil, R Snyders Thin Solid Films 606, 19-44, 2016 | 131 | 2016 |
Measurement of ionic and neutral densities in amplified magnetron discharges by pulsed absorption spectroscopy S Konstantinidis, A Ricard, M Ganciu, JP Dauchot, C Ranea, M Hecq Journal of applied physics 95 (5), 2900-2905, 2004 | 95 | 2004 |
Transport of ionized metal atoms in high-power pulsed magnetron discharges assisted by inductively coupled plasma S Konstantinidis, JP Dauchot, M Ganciu, M Hecq Applied physics letters 88 (2), 2006 | 86 | 2006 |
Highly ordered hollow oxide nanostructures: the Kirkendall effect at the nanoscale AA El Mel, M Buffière, PY Tessier, S Konstantinidis, W Xu, K Du, ... Small 9 (17), 2838-2843, 2013 | 76 | 2013 |
Ion composition produced by high power impulse magnetron sputtering discharges near the substrate AP Ehiasarian, A Vetushka, A Hecimovic, S Konstantinidis Journal of Applied Physics 104 (8), 2008 | 76 | 2008 |
Deposition of zinc oxide layers by high-power impulse magnetron sputtering S Konstantinidis, A Hemberg, JP Dauchot, M Hecq Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007 | 74 | 2007 |
Density and temperature in an inductively amplified magnetron discharge for titanium deposition A Ricard, C Nouvellon, S Konstantinidis, JP Dauchot, M Wautelet, M Hecq Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 20 (4 …, 2002 | 64 | 2002 |
Particle visualization in high-power impulse magnetron sputtering. I. 2D density mapping N Britun, M Palmucci, S Konstantinidis, R Snyders Journal of Applied Physics 117 (16), 2015 | 61 | 2015 |
Deposition of titanium oxide films by reactive High Power Impulse Magnetron Sputtering (HiPIMS): Influence of the peak current value on the transition from metallic to poisoned … C Nouvellon, M Michiels, JP Dauchot, C Archambeau, F Laffineur, ... Surface and Coatings Technology 206 (16), 3542-3549, 2012 | 59 | 2012 |
Synthesis of nanostructured Ti thin films by combining glancing angle deposition and magnetron sputtering: A joint experimental and modeling study J Dervaux, PA Cormier, P Moskovkin, O Douheret, S Konstantinidis, ... Thin Solid Films 636, 644-657, 2017 | 58 | 2017 |
Mass spectrometry diagnostics of short-pulsed HiPIMS discharges M Palmucci, N Britun, T Silva, R Snyders, S Konstantinidis Journal of Physics D: Applied Physics 46 (21), 215201, 2013 | 56 | 2013 |
Preionised pulsed magnetron discharges for ionised physical vapour deposition M Ganciu, S Konstantinidis, Y Paint, JP Dauchot, M Hecq, L de Poucques, ... J. Optoelectron. Adv. Mater 7 (5), 2481-2484, 2005 | 54 | 2005 |
Rarefaction windows in a high-power impulse magnetron sputtering plasma M Palmucci, N Britun, S Konstantinidis, R Snyders Journal of Applied Physics 114 (11), 2013 | 53 | 2013 |
Oxygen vacancy stabilized zirconia (OVSZ); a joint experimental and theoretical study M Raza, D Cornil, J Cornil, S Lucas, R Snyders, S Konstantinidis Scripta Materialia 124, 26-29, 2016 | 52 | 2016 |
On the phase formation of sputtered hafnium oxide and oxynitride films K Sarakinos, D Music, S Mráz, K Jiang, F Nahif, A Braun, C Zilkens, ... Journal of Applied Physics 108 (1), 2010 | 52 | 2010 |
IR emission from the target during plasma magnetron sputter deposition PA Cormier, AL Thomann, V Dolique, A Balhamri, R Dussart, N Semmar, ... Thin Solid Films 545, 44-49, 2013 | 51 | 2013 |