| Role of light intensification by cracks in optical breakdown on surfaces FY Genin, A Salleo, TV Pistor, LL Chase JOSA A 18 (10), 2607-2616, 2001 | 281 | 2001 |
| Laser intensification by spherical inclusions embedded within multilayer coatings CJ Stolz, MD Feit, TV Pistor Applied optics 45 (7), 1594-1601, 2006 | 110 | 2006 |
| Electromagnetic simulation and modeling with applications in lithography TV Pistor University of California, Berkeley, 2001 | 106 | 2001 |
| Rigorous 3D simulation of phase defects in alternating phase-shifting masks TV Pistor 21st Annual BACUS Symposium on Photomask Technology 4562, 1038-1050, 2002 | 89 | 2002 |
| Modeling oblique incidence effects in photomasks TV Pistor, AR Neureuther, RJ Socha Optical Microlithography XIII 4000, 228-237, 2000 | 88 | 2000 |
| Light intensification modeling of coating inclusions irradiated at 351 and 1053 nm CJ Stolz, S Hafeman, TV Pistor Applied optics 47 (13), C162-C166, 2008 | 60 | 2008 |
| Electric-field enhancement by nodular defects in multilayer coatings irradiated at normal and 45 incidence CJ Stolz, FY Genin, TV Pistor Laser-Induced Damage in Optical Materials: 2003 5273, 41-49, 2004 | 48 | 2004 |
| Rigorous simulation of mask corner effects in extreme ultraviolet lithography TV Pistor, K Adam, A Neureuther Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1998 | 48 | 1998 |
| Calculating aerial images from EUV masks TV Pistor, AR Neureuther Emerging Lithographic Technologies III 3676, 679-696, 1999 | 37 | 1999 |
| Searching for optimal mitigation geometries for laser-resistant multilayer high-reflector coatings SR Qiu, JE Wolfe, AM Monterrosa, MD Feit, TV Pistor, CJ Stolz Applied Optics 50 (9), C373-C381, 2011 | 36 | 2011 |
| Impact of substrate surface scratches on the laser damage resistance of multilayer coatings SR Qiu, JE Wolfe, AM Monterrosa, WA Steele, NE Teslich, MD Feit, ... Laser-Induced Damage in Optical Materials: 2010 7842, 490-499, 2010 | 18 | 2010 |
| Effects of shifter edge topography on through focus performance S Hotta, TV Pistor, K Adam, AR Neureuther 20th Annual BACUS Symposium on Photomask Technology 4186, 827-837, 2001 | 17 | 2001 |
| Modeling of light intensification by conical pits within multilayer high reflector coatings SR Qiu, JE Wolfe, AM Monterrosa, MD Feit, TV Pistor, CJ Stolz Laser-Induced Damage in Optical Materials: 2009 7504, 211-219, 2009 | 16 | 2009 |
| Photoresist shrinkage effects at EUV TV Pistor, TI Wallow, CN Anderson, PP Naulleau Extreme Ultraviolet (EUV) Lithography II 7969, 407-419, 2011 | 13 | 2011 |
| Models for characterizing the printability of buried EUV defects Y Deng, TV Pistor, AR Neureuther Emerging Lithographic Technologies V 4343, 551-558, 2001 | 13 | 2001 |
| Evaluating printability of buried native EUV mask phase defects through a modeling and simulation approach M Upadhyaya, V Jindal, A Basavalingappa, H Herbol, J Harris-Jones, ... Extreme Ultraviolet (EUV) Lithography VI 9422, 204-217, 2015 | 10 | 2015 |
| Rigorous electromagnetic simulation of stepper alignment TV Pistor, RJ Socha Metrology, Inspection, and Process Control for Microlithography XVI 4689 …, 2002 | 10 | 2002 |
| LAVA web-based remote simulation: enhancements for education and technology innovation SI Lee, KC Ng, T Orimoto, J Pittenger, T Horie, K Adam, M Cheng, ... Optical Microlithography XIV 4346, 1500-1506, 2001 | 10 | 2001 |
| Atomic force metrology and 3D modeling of microtrenching in etched photomask features B Todd, EK Miller, TV Pistor Metrology, Inspection, and Process Control for Microlithography XV 4344, 208-221, 2001 | 10 | 2001 |
| Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects M Upadhyaya, A Basavalingappa, H Herbol, G Denbeaux, V Jindal, ... Journal of Vacuum Science & Technology B 33 (2), 2015 | 9 | 2015 |