| Silicon tolerance specification using shapes as design intent markers M Cote, M Rieger, P Hurat, R Lugg, J Mayhew US Patent 7,458,045, 2008 | 226 | 2008 |
| Fast proximity correction with zone sampling JP Stirniman, ML Rieger Optical/Laser Microlithography VII 2197, 294-301, 1994 | 195 | 1994 |
| Proximity correction system for wafer lithography ML Rieger, JP Stirniman US Patent 6,081,658, 2000 | 115 | 2000 |
| Proximity correction software for wafer lithography ML Rieger, JP Stirniman US Patent 6,289,499, 2001 | 106 | 2001 |
| Wafer Proximity Correction and Its Impact on Mask-Making J Stirniman, ML Rieger Bacus News 10 (1), 1, 1994 | 102 | 1994 |
| Using behavior modeling for proximity correction ML Rieger, JP Stirniman Optical/Laser Microlithography VII 2197, 371-376, 1994 | 97 | 1994 |
| System for Lithography Proximity Compensation M Rieger, JP Stirniman Precim Company, Portland, Oregon 28, 1993 | 94 | 1993 |
| Spatial-filter models to describe IC lithographic behavior JP Stirniman, ML Rieger Optical Microlithography X 3051, 469-478, 1997 | 87 | 1997 |
| Rasterization system utilizing an overlay of bit-mapped low address resolution databases PA Warkentin, ML Rieger, CA Michalski, MJ Jolley US Patent 4,879,605, 1989 | 74 | 1989 |
| Method of pixel to vector conversion in an automatic picture coding system BE McCann, ML Rieger US Patent 4,777,651, 1988 | 67 | 1988 |
| Customizing proximity correction for process-specific objectives ML Rieger, JP Stirniman Optical Microlithography IX 2726, 651-659, 1996 | 66 | 1996 |
| Optimizing proximity correction for wafer fabrication processes JP Stirniman, ML Rieger 14th Annual BACUS Symposium on Photomask Technology and Management 2322, 239-246, 1994 | 59 | 1994 |
| Dual-mask model-based proximity correction for high-performance 0.10-um CMOS process SR Palmer, ME Mason, JN Randall, T Aton, K Kim, AV Tritchkov, J Burdorf, ... 20th Annual BACUS Symposium on Photomask Technology 4186, 921-932, 2001 | 56 | 2001 |
| Laser pattern generation apparatus PC Allen, MJ Jolley, RL Teitzel, M Rieger, M Bohan, T Thomas US Patent 5,386,221, 1995 | 56 | 1995 |
| Quantifying proximity and related effects in advanced wafer processes JP Stirniman, ML Rieger, RE Gleason Optical/Laser Microlithography VIII 2440, 252-260, 1995 | 51 | 1995 |
| Image quality enhancements for raster scan lithography ML Rieger, JA Schoeffel, PA Warkentin Optical/Laser Microlithography 922, 55-65, 1988 | 47 | 1988 |
| Mask fabrication rules for proximity-corrected patterns ML Rieger, JP Stirniman 16th Annual BACUS Symposium on Photomask Technology and Management 2884, 323-332, 1996 | 44 | 1996 |
| Layout design methodolgies for sub-wavelength manufacturing ML Rieger, JP Mayhew, S Panchapakesan Proceedings of the 38th annual Design Automation Conference, 85-88, 2001 | 40 | 2001 |
| Graphics matrix multiplier ML Rieger US Patent 4,283,765, 1981 | 38 | 1981 |
| OPC strategies to minimize mask cost and writing time ML Rieger, JP Mayhew, J Li, JP Shiely 21st Annual BACUS Symposium on Photomask Technology 4562, 154-160, 2002 | 30 | 2002 |