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Christian Dussarrat
Christian Dussarrat
Air Liquide
Verified email at airliquide.com
Title
Cited by
Cited by
Year
Method of forming dielectric films, new precursors and their use in semiconductor manufacturing
C Dussarrat, N Blasco, A Pinchart, C Lachaud
US Patent 8,668,957, 2014
5542014
Organosilane precursors for ALD/CVD silicon-containing film applications
C Dussarrat, G Kuchenbeiser, VR Pallem
US Patent 9,371,338, 2016
5052016
Method of forming silicon oxide containing films
C Dussarrat, J Gatineau, K Yanagita, E Tsukada, I Suzuki
US Patent 8,227,032, 2012
4392012
Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films
VR Pallem, C Dussarrat
US Patent 8,283,201, 2012
4262012
Method of forming silicon-containing films
C Dussarrat
US Patent App. 12/233,057, 2009
4102009
Hexakis (monohydrocarbylamino) disilanes and method for the preparation thereof
C Dussarrat, JM Girard
US Patent 7,019,159, 2006
3982006
Metal precursors containing beta-diketiminato ligands
C Dussarrat, BJ Feist
US Patent 9,103,019, 2015
3562015
Novel lanthanide beta-diketonate precursors for lanthanide thin film deposition
C Dussarrat, VM Omarjee
US Patent App. 12/536,804, 2010
3492010
Hafnium-containing film forming compositions for vapor deposition of hafnium-containing films
C Dussarrat, JM Girard, H Ishii, C Lansalot-Matras, J Lieffrig
US Patent App. 15/337,765, 2017
3462017
Cyclic organoaminosilane precursors for forming silicon-containing films and methods of using the same
K Higashino, G Kuchenbeiser, C Dussarrat
US Patent App. 15/199,330, 2016
3442016
Use of ruthenium tetroxide as a precursor and reactant for thin film depositions
J Gatineau, C Dussarrat
US Patent 8,859,047, 2014
3442014
Process for forming gate insulators for tft structures
C Dussarrat, C Lansalot-Matras, A Colas
US Patent App. 15/199,223, 2016
2722016
Preparation of Lanthanide-Containing Precursors and Deposition of Lanthanide-Containing Films
VR Pallem, BJ Feist, N Stafford, C Dussarrat
US Patent App. 12/414,152, 2010
2702010
Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
JG Song, GH Ryu, SJ Lee, S Sim, CW Lee, T Choi, H Jung, Y Kim, Z Lee, ...
Nature communications 6 (1), 7817, 2015
2312015
Atomic Layer Deposition of SrTiO3 Thin Films with Highly Enhanced Growth Rate for Ultrahigh Density Capacitors
SW Lee, JH Han, S Han, W Lee, JH Jang, M Seo, SK Kim, C Dussarrat, ...
Chemistry of Materials 23 (8), 2227-2236, 2011
1562011
A review of cation-ordered rock salt superstructure oxides
GC Mather, C Dussarrat, J Etourneau, AR West
Journal of Materials Chemistry 10 (10), 2219-2230, 2000
1562000
Hydrophobicity of rare earth oxides grown by atomic layer deposition
IK Oh, K Kim, Z Lee, KY Ko, CW Lee, SJ Lee, JM Myung, ...
Chemistry of Materials 27 (1), 148-156, 2015
1472015
Methods for producing silicon nitride films and silicon oxynitride films by thermal chemical vapor deposition
C Dussarrat, JM Girard, T Kimura, N Tamaoki, Y Sato
US Patent 7,192,626, 2007
1172007
Atomic layer deposition and characterization of vanadium oxide thin films
T Blanquart, J Niinistö, M Gavagnin, V Longo, M Heikkilä, E Puukilainen, ...
RSC advances 3 (4), 1179-1185, 2013
1162013
Plasma-enhanced atomic layer deposition of cobalt using cyclopentadienyl isopropyl acetamidinato-cobalt as a precursor
JM Kim, C Lansalot, C Dussarrat, J Gatineau, H Kim
Japanese journal of applied physics 49 (5S2), 05FA10, 2010
1132010
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Articles 1–20