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jiangwei li
jiangwei li
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Method for process window optimized optical proximity correction
J Ye, LI Jiangwei, S Hunsche
US Patent 8,413,081, 2013
622013
Multivariable solver for optical proximity correction
WS Wong, C Been-Der, LU Yenwen, LI Jiangwei, T Nishibe
US Patent 7,707,538, 2010
532010
Method for process window optimized optical proximity correction
J Ye, LI Jiangwei, S Hunsche
US Patent 7,694,267, 2010
442010
Method for performing pattern decomposition for a full chip design
L Chen, H Chen, LI Jiangwei, RJ Socha
US Patent 8,572,521, 2013
342013
OPC strategies to minimize mask cost and writing time
ML Rieger, JP Mayhew, J Li, JP Shiely
21st Annual BACUS Symposium on Photomask Technology 4562, 154-160, 2002
302002
Method for process window optimized optical proximity correction
J Ye, LI Jiangwei, S Hunsche
US Patent 8,832,610, 2014
272014
Method and apparatus for cost function based simultaneous OPC and SBAR optimization
J Tao, C Been-Der, YW Lu, LI Jiangwei, MC Tsai, D Mao
US Patent 8,812,998, 2014
262014
Model-based optical proximity correction including effects of photoresist processes
J Li, DA Bernard, JC Rey, VV Boksha
Optical Microlithography X 3051, 643-651, 1997
181997
Method of pattern selection for source and mask optimization
H Liu, L Chen, H Chen, ZP Li, J Ye, MC Tsai, Y Zhang, YW Lu, LI Jiangwei
US Patent 8,739,082, 2014
172014
Efficient computational techniques for aerial imaging simulation
DA Bernard, J Li, JC Rey, K Rouz, V Axelrad
Optical Microlithography IX 2726, 273-287, 1996
171996
Simulating near field image in optical lithography
LI Jiangwei, Y Wang, J Liu
US Patent 10,209,615, 2019
122019
Cusp-like flaws along a rough surface
J Li, C Chiu, H Gao, TW Wu
Thin solid films 236 (1-2), 240-246, 1993
111993
Correction for flare effects in lithography system
H Liu, LI Jiangwei, L Chen, W Liu, J Jiang
US Patent 8,887,104, 2014
82014
Verifying RET mask layouts
JP Mayhew, ML Rieger, J Li, L Zhang, Z Tang, JP Shiely
Design, Process Integration, and Characterization for Microelectronics 4692 …, 2002
82002
Novel methodology for postexposure bake calibration and optimization based on electrical linewidth measurement and process metamodeling
L Capodieci, R Subramanian, B Rangarajan, WD Heavlin, J Li, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1998
71998
Dose Map Optimization for Mask Making
J Lin, LI Jiangwei, LAN Song, K Zhao, J Huang
US Patent App. 16/141,197, 2020
62020
Multivariable solver for optical proximity correction
WS Wong, C Been-Der, LU Yenwen, LI Jiangwei, T Nishibe
US Patent 8,291,352, 2012
62012
Multivariable solver for optical proximity correction
WS Wong, C Been-Der, YW Lu, LI Jiangwei, T Nishibe
US Patent 8,448,099, 2013
52013
Application of FreeForm MRC to SRAF optimization based on ILT mask optimization
J Huang, K Zhao, LI Jiangwei
US Patent 10,656,530, 2020
42020
Sub-half-micron contact window design with 3D photolithography simulator
SK Brainerd, DA Bernard, JC Rey, J Li, Y Granik, VV Boksha
Optical Microlithography X 3051, 552-566, 1997
41997
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