Method for process window optimized optical proximity correction J Ye, LI Jiangwei, S Hunsche US Patent 8,413,081, 2013 | 62 | 2013 |
Multivariable solver for optical proximity correction WS Wong, C Been-Der, LU Yenwen, LI Jiangwei, T Nishibe US Patent 7,707,538, 2010 | 53 | 2010 |
Method for process window optimized optical proximity correction J Ye, LI Jiangwei, S Hunsche US Patent 7,694,267, 2010 | 44 | 2010 |
Method for performing pattern decomposition for a full chip design L Chen, H Chen, LI Jiangwei, RJ Socha US Patent 8,572,521, 2013 | 34 | 2013 |
OPC strategies to minimize mask cost and writing time ML Rieger, JP Mayhew, J Li, JP Shiely 21st Annual BACUS Symposium on Photomask Technology 4562, 154-160, 2002 | 30 | 2002 |
Method for process window optimized optical proximity correction J Ye, LI Jiangwei, S Hunsche US Patent 8,832,610, 2014 | 27 | 2014 |
Method and apparatus for cost function based simultaneous OPC and SBAR optimization J Tao, C Been-Der, YW Lu, LI Jiangwei, MC Tsai, D Mao US Patent 8,812,998, 2014 | 26 | 2014 |
Model-based optical proximity correction including effects of photoresist processes J Li, DA Bernard, JC Rey, VV Boksha Optical Microlithography X 3051, 643-651, 1997 | 18 | 1997 |
Method of pattern selection for source and mask optimization H Liu, L Chen, H Chen, ZP Li, J Ye, MC Tsai, Y Zhang, YW Lu, LI Jiangwei US Patent 8,739,082, 2014 | 17 | 2014 |
Efficient computational techniques for aerial imaging simulation DA Bernard, J Li, JC Rey, K Rouz, V Axelrad Optical Microlithography IX 2726, 273-287, 1996 | 17 | 1996 |
Simulating near field image in optical lithography LI Jiangwei, Y Wang, J Liu US Patent 10,209,615, 2019 | 12 | 2019 |
Cusp-like flaws along a rough surface J Li, C Chiu, H Gao, TW Wu Thin solid films 236 (1-2), 240-246, 1993 | 11 | 1993 |
Correction for flare effects in lithography system H Liu, LI Jiangwei, L Chen, W Liu, J Jiang US Patent 8,887,104, 2014 | 8 | 2014 |
Verifying RET mask layouts JP Mayhew, ML Rieger, J Li, L Zhang, Z Tang, JP Shiely Design, Process Integration, and Characterization for Microelectronics 4692 …, 2002 | 8 | 2002 |
Novel methodology for postexposure bake calibration and optimization based on electrical linewidth measurement and process metamodeling L Capodieci, R Subramanian, B Rangarajan, WD Heavlin, J Li, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1998 | 7 | 1998 |
Dose Map Optimization for Mask Making J Lin, LI Jiangwei, LAN Song, K Zhao, J Huang US Patent App. 16/141,197, 2020 | 6 | 2020 |
Multivariable solver for optical proximity correction WS Wong, C Been-Der, LU Yenwen, LI Jiangwei, T Nishibe US Patent 8,291,352, 2012 | 6 | 2012 |
Multivariable solver for optical proximity correction WS Wong, C Been-Der, YW Lu, LI Jiangwei, T Nishibe US Patent 8,448,099, 2013 | 5 | 2013 |
Application of FreeForm MRC to SRAF optimization based on ILT mask optimization J Huang, K Zhao, LI Jiangwei US Patent 10,656,530, 2020 | 4 | 2020 |
Sub-half-micron contact window design with 3D photolithography simulator SK Brainerd, DA Bernard, JC Rey, J Li, Y Granik, VV Boksha Optical Microlithography X 3051, 552-566, 1997 | 4 | 1997 |