| Handbook of plasma processing technology: fundamentals, etching, deposition, and surface interactions SM Rossnagel, JJ Cuomo, WD Westwood (No Title), 1990 | 1146* | 1990 |
| Alteration of Cu conductivity in the size effect regime SM Rossnagel, TS Kuan Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004 | 555 | 2004 |
| Metal ion deposition from ionized mangetron sputtering discharge SM Rossnagel, J Hopwood Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1994 | 505 | 1994 |
| METHOD OF PE-ALD OF SiNxCy AND INTEGRATION OF LINER MATERIALS ON POROUS LOW K SUBSTRATES AJ Kellock, H Kim, DG Park, SV Nitta, S Purushothaman, S Rossnagel, ... US Patent App. 12/203,338, 2010 | 454 | 2010 |
| Magnetron sputter deposition with high levels of metal ionization SM Rossnagel, J Hopwood Applied physics letters 63 (24), 3285-3287, 1993 | 387 | 1993 |
| Gas density reduction effects in magnetrons SM Rossnagel Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 6 (1 …, 1988 | 349 | 1988 |
| Ionic field effect transistors with sub-10 nm multiple nanopores SW Nam, MJ Rooks, KB Kim, SM Rossnagel Nano letters 9 (5), 2044-2048, 2009 | 322 | 2009 |
| Thin film deposition with physical vapor deposition and related technologies SM Rossnagel Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 21 (5 …, 2003 | 319 | 2003 |
| Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers SM Rossnagel, A Sherman, F Turner Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000 | 302 | 2000 |
| Structure for confining the switching current in phase memory (PCM) cells GW Burr, CH Lam, S Raoux, SM Rossnagel, AG Schrott, JZ Sun, ... US Patent 7,488,967, 2009 | 288 | 2009 |
| Directional and ionized physical vapor deposition for microelectronics applications SM Rossnagel Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1998 | 221 | 1998 |
| Collimated magnetron sputter deposition SM Rossnagel, D Mikalsen, H Kinoshita, JJ Cuomo Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 9 (2 …, 1991 | 205 | 1991 |
| Phase transformation of thin sputter-deposited tungsten films at room temperature SM Rossnagel, IC Noyan, C Cabral Jr Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002 | 193 | 2002 |
| PVD for microelectronics: sputter deposition applied to semiconductor manufacturing RA Powell, SM Rossnagel (No Title), 1999 | 185 | 1999 |
| Systems and methods for controlling position of charged polymer inside nanopore S Polonsky, SM Rossnagel, GA Stolovitzky US Patent 8,003,319, 2011 | 181 | 2011 |
| Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition H Kim, C Cabral Jr, C Lavoie, SM Rossnagel Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002 | 170 | 2002 |
| Film modification by low energy ion bombardment during deposition SM Rossnagel, JJ Cuomo Thin Solid Films 171 (1), 143-156, 1989 | 162 | 1989 |
| Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition H Kim, C Detavenier, O Van der Straten, SM Rossnagel, AJ Kellock, ... Journal of applied physics 98 (1), 2005 | 159 | 2005 |
| Sputter deposition for semiconductor manufacturing SM Rossnagel IBM Journal of Research and development 43 (1.2), 163-179, 1999 | 159 | 1999 |
| Current–voltage relations in magnetrons SM Rossnagel, HR Kaufman Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 6 (2 …, 1988 | 156 | 1988 |